Film deposition system

Refrigeration – Storage of solidified or liquified gas – With vapor discharged from storage receptacle

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Details

62 502, 62 511, F17C 704

Patent

active

050314084

ABSTRACT:
A cryocrucible permits the introduction of ion clusters of a cryogen, like oxygen or nitrogen, to a vacuum chamber, and preferably comprises a liquid cryogen containment vessel connected to an expansion chamber through a solenoid-actuated valve, a cooling means for maintaining the cryogen as a liquid in the containment vessel, and a nozzle connecting the expansion chamber to the vacuum chamber. Liquid evaporates through the valve into the expansion chamber and, then, forms clusters when it expands further while passing through the nozzle into the vacuum chamber.

REFERENCES:
patent: 3258602 (1966-06-01), Promish
patent: 3566829 (1971-03-01), Hill
patent: 3583361 (1971-06-01), Laudel, Jr.
patent: 3974059 (1976-08-01), Murayama
patent: 4068495 (1978-01-01), Alger et al.
patent: 4082636 (1978-04-01), Takagi
patent: 4217855 (1980-08-01), Takagi
patent: 4286545 (1981-09-01), Takagi et al.
patent: 4302950 (1981-12-01), Sitte
patent: 4342631 (1982-08-01), White et al.
patent: 4352392 (1982-10-01), Eastman
patent: 4406129 (1983-09-01), Mills
patent: 4451499 (1984-05-01), Morimoto et al.
patent: 4495782 (1985-01-01), Sazour et al.
patent: 4532779 (1985-08-01), Von der Bey et al.
patent: 4559096 (1985-12-01), Friedman et al.
patent: 4559901 (1985-12-01), Morimoto et al.
patent: 4685976 (1987-08-01), Schachameyer et al.
patent: 4686022 (1987-08-01), Rempt
patent: 4724106 (1988-02-01), Morimoto et al.
patent: 4740267 (1988-04-01), Knauer et al.
"New Developments in Ionized Cluster Beam and Reactive Cluster Beam Deposition Techniques"; Thin Solid Films, 63 (1979), pp. 41-51, Takagi et al.
"Formation and Detection of High-Energy Cluster Beams", Rarefied Gas Dynamics, Jul. 1976, pp. 1123-1135, Hagena et al.
Molecular Beams and Low Density Gasdynamics: 1974, pp. 93-181; Wegener.

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