Film deposition device

Coating apparatus – With indicating – testing – inspecting – or measuring means

Reexamination Certificate

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Details

C118S7230AN, C156S345280, C204S298010

Reexamination Certificate

active

10954145

ABSTRACT:
A film deposition device for depositing a film includes a depositing chamber for depositing the film with plasma. A plasma quantity monitoring device is disposed in the depositing chamber for monitoring a plasma quantity entering the depositing chamber at real time. A calculating device is electrically connected to the plasma quantity monitoring device for calculating a thickness of the film from the plasma quantity so that the thickness is monitored at real time.

REFERENCES:
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patent: 5858477 (1999-01-01), Veerasamy et al.
patent: 6847036 (2005-01-01), Darling et al.
patent: 2002/0030167 (2002-03-01), Liebert et al.
patent: 2002/0068132 (2002-06-01), Skinner et al.
patent: 2002/0070347 (2002-06-01), Bisson et al.
patent: 57087829 (1982-06-01), None
patent: 6-331810 (1994-12-01), None

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