Film deposition apparatus and film deposition method

Details Film deposition apparatus and film deposition method Film deposition apparatus and film deposition method

2006-02-28

2006-02-28

Bueker, Richard (Department: 1763)

Chemistry: electrical and wave energy

Apparatus

Vacuum arc discharge coating

C118S7230VE, C118S7230HC

Reexamination Certificate

active

07005047

ABSTRACT:
A particle film deposition apparatus and method are provided, with which ultra fine particles are generated by arc heating. The generated ultra fine particles can be efficiently sucked up into a transfer tube regardless of an arc voltage, and the resulting film can be stable in shape. An evaporation material8to be evaporated by arc heating and to generate ultra fine particles is connected to an electrode. As other electrodes, a plurality of rods17each having a discharge section at the tip thereof are provided. These rods17are so arranged as to be directed in each different direction with respect to the evaporation material8.

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