Film deposition apparatus

Details Film deposition apparatus Film deposition apparatus

1995-05-30

1996-09-17

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118725, 118726, 118728, 20429815, 20429825, 20429826, C23C 1400

Patent

active

055564720

ABSTRACT:
A MBE film deposition apparatus comprises a vacuum chamber provided with a partition wall for dividing the vacuum chamber into a first sub-chamber and a second sub-chamber, which are independently provided with a main evacuating apparatus and a auxiliary evacuating apparatus, respectively. The partition wall including an opening for introducing a vacuum impedance for molecular flows between the tint sub-chamber and the second sub-chamber so that a pressure difference can be created between the first sub-chamber and the second sub-chamber when the opening is open. A gate valve is provided on the partition wall for hermetically closing the opening of the partition wall so as to shut off the molecular flows between the first sub-chamber and the second sub-chamber. At least one evaporation source is provided in the first sub-chamber, and a substrate holder is located within the second sub-chamber. A gas supplying apparatus is provided in the second sub-chamber so as to supplying a predetermined gas to the second sub-chamber.

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