Film-depositing target and preparation of phase shift mask...

Details Film-depositing target and preparation of phase shift mask... Film-depositing target and preparation of phase shift mask...

2005-03-30

2009-10-06

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C204S298130

Reexamination Certificate

active

07598004

ABSTRACT:
For the manufacture of a halftone phase shift mask blank comprising a transparent substrate and a translucent film of one or more layers having a controlled phase and transmittance, at least one layer of the translucent film comprising Si, Mo and Zr at the same time, a target comprising at least Zr and Mo in a molar ratio Zr/Mo between 0.05 and 5 is useful.

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English Translation of the Japanese Office Action, mailed Nov. 12, 2008.

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