Film depositing apparatus and a film depositing method

Details Film depositing apparatus and a film depositing method Film depositing apparatus and a film depositing method

1983-01-11

1985-02-26

Morgenstern, Norman

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

118 501, 118723, 118729, 118730, 118733, 427 39, 427240, 427255, B05D 306, C23C 1308

Patent

active

045017662

ABSTRACT:
A film depositing apparatus forms a film with a given thickness on each of a plurality of bases. The apparatus is provided with a casing removably mounted on a base section to form a film depositing chamber whose interior is isolated from the outside space; transfer mechanism for transferring the plurality of bases in one direction inside the film depositing chamber; gas supplying mechanism for feeding material gas into the casing, the gas supplying mechanism including injecting portions arranged along said one direction in the film depositing chamber to inject the material gas in the casing into the film depositing chamber along said one direction; and electric discharge mechanism for activating the material gas injected into the film depositing chamber by the injecting portions.

REFERENCES:
patent: 2995463 (1961-08-01), Meister et al.
patent: 3865072 (1975-02-01), Kirkman
patent: 4225222 (1980-09-01), Kempler
IBM Technical Disclosure Bulletin, vol. 18, No. 5, Oct. 1975.

Affiliated with

Also associated with

Rating

Film depositing apparatus and a film depositing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Film depositing apparatus and a film depositing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Film depositing apparatus and a film depositing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-516616