Filled grid mask

Details Filled grid mask Filled grid mask

1988-02-26

1989-05-02

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2505051, 378 35, 430 5, H01J 37317

Patent

active

048271381

ABSTRACT:
A mask (38), which is particularly useful in parallel-printing ion beam lithography because of its dimensional stability, is disclosed. The mask (38) represents a relatively rigid screen (22) constructed from a relatively rigid material, such as monocrystalline silicon, with meshes (28) formed through the screen (22) over the entire area of the screen (22). The preferred embodiment applies a less rigid filler material (34) into the meshes (28) over the entire area of the screen (22), then removes the filler material (34) from transmissive areas (42) of the mask (38).

REFERENCES:
patent: 4451544 (1988-05-01), Kawabuchi
patent: 4647517 (1987-03-01), Hersener et al.

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