Filament lamp for wafer heating and heating light source

Details Filament lamp for wafer heating and heating light source Filament lamp for wafer heating and heating light source

1998-12-15

2000-06-27

Wong, Don

Electric lamp and discharge devices: systems

Combined load device or load device temperature modifying...

Filament, electric heater, or resistance in shunt with the...

315 94, 219405, 219411, H05B 100, F27D 1100

Patent

active

060810726

ABSTRACT:
A heating light source for a heat treatment device of the light irradiation type with high temperature uniformity on the wafer surface during heating and a small operating current and a lamp which is used for the heating light source. By using a light source in which several annular lamps are arranged concentrically within the same plane the need for a large device due to large currents is obviated. By arranging nonemission parts distributed over the entire peripheral direction of an annular filament lamp and not only on one side, and by arranging these filament light sources in the radial direction of a lamp in which several of these light sources are used distributed and not on one side, the irradiance on the entire wafer surface is made essentially uniform. These nonemission parts have a radiance which is controlled such that the irradiance on the wafer surface directly underneath the region in the vicinity of the insertion tubes in which the filament does not uniformly extend essentially agrees with the irradiance of the wafer surface directly underneath the nonemission parts.

REFERENCES:
patent: 4511788 (1985-04-01), Arai et al.
patent: 4535228 (1985-08-01), Mimura et al.
patent: 4578144 (1986-03-01), Hiramoto
patent: 4832249 (1989-05-01), Ehler
patent: 5128515 (1992-07-01), Tanaka
patent: 5386491 (1995-01-01), Mewissen et al.
patent: 5889258 (1999-03-01), Lubomirski et al.

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