Radiant energy – Means to align or position an object relative to a source or...
Patent
1994-06-28
1997-07-22
Berman, Jack I.
Radiant energy
Means to align or position an object relative to a source or...
250397, 257428, 257448, 257459, H01L 2170
Patent
active
056506295
ABSTRACT:
An alignment mark and pattern is disclosed for use on semiconductor substrates which are to be patterned in an electron lithography machine. The detector includes two interleaved N-well portions mounted on a P-substrate. The interleaved "fingers" of the N-well portions are spaced to provide narrow gaps which are approximately the width of a projected electron beam. When the beam is located within the gap (or gaps) the projection is in alignment.
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Auton William G.
Berman Jack I.
Burstyn Harold L.
Nguyen Kiet T.
The United States of America as represented by the Secretary of
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