Field-symmetric beam detector for semiconductors

Radiant energy – Means to align or position an object relative to a source or...

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250397, 257428, 257448, 257459, H01L 2170

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active

056506295

ABSTRACT:
An alignment mark and pattern is disclosed for use on semiconductor substrates which are to be patterned in an electron lithography machine. The detector includes two interleaved N-well portions mounted on a P-substrate. The interleaved "fingers" of the N-well portions are spaced to provide narrow gaps which are approximately the width of a projected electron beam. When the beam is located within the gap (or gaps) the projection is in alignment.

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