Field emission type electron emitting device with convex insulat

Electric lamp and discharge devices – Discharge devices having three or more electrodes

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313309, 313310, 313336, 313346R, 313351, H01J 146, H01J 2110, H01J 102, H01J 116

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active

057931534

ABSTRACT:
In a comb-like or wedge-like electron emitting device, an emitter or both an emitter and an anode electrode are processed from a single-crystal silicon thin film of an SOI wafer. The single-crystal silicon thin film in portions other than the processed portion is removed so that the silicon oxide layer is dug down further slightly. A gate electrode for applying an electric field in order to draw electrons out of the emitter is provided in the dug-down portion. When the end and side faces of the emitter are formed as (111) faces by anisotropic etching in the condition that the single-crystal silicon thin film is oriented to a (100) face, the emitter has a sharp edge at about 55.degree. with respect to the substrate. In a conical electron emitting device, the gate electrode is constituted by a single-crystal silicon thin film of an SOI wafer so that a pyramid surrounded by the (111) faces is formed on the single-crystal silicon substrate.

REFERENCES:
patent: 4168213 (1979-09-01), Hoeberechts
patent: 5319233 (1994-06-01), Kane
patent: 5381069 (1995-01-01), Itoh et al.
patent: 5502314 (1996-03-01), Hori
31-a-NC-4 Electrical Characteristics of Si-Film Field Emitter, C. Nureki et al., Extended Abstracts (The 39th Spring Meeting, 1992); The Japan Society of Applied Physics and Related Societies, p. 578 (1992).
Junji Itoh, Kazunari Ushiki, Kazuhiko Tsuburaya and Seigo Kanemaru, "Vacuum Microtriode with Comb-Shaped Lateral Field-Emitter Array," Japanese Journal of Applied Physics, vol. 32, No. 6A, Jun. 1, 1933, pp. L809-L812.

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