Field-emission electron source

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Low workfunction layer for electron emission

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313336, 313304, H01L 2906, H01J 116, H01J 1910

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active

059258918

ABSTRACT:
A withdrawn electrode is formed on a silicon substrate with intervention of upper and lower silicon oxide films each having circular openings corresponding to regions in which cathodes are to be formed. Tower-shaped cathodes are formed in the respective openings of the upper and lower silicon oxide films and of the withdrawn electrode. Each of the cathodes has a sharply tapered tip portion having a radius of 2 nm or less, which has been formed by crystal anisotropic etching and thermal oxidation process for silicon. The region of the silicon substrate exposed in the openings of the upper and lower silicon oxide films and the cathode have their surfaces coated with a thin surface coating film made of a material having a low work function.

REFERENCES:
patent: 3581151 (1971-05-01), Boyle
patent: 4663559 (1987-05-01), Christensen
patent: 5554859 (1996-09-01), Tsukamoto et al.
Takai et al., "Enhancement in emission current from dry-processed n-type Si field emitter arrays after tip anodization", J. Vac. Sci. Technology B13 (2), pp. 441-444, 1995.
Yoshikazu Hori et al.: "Tower Structure Si Filed Emitter Arrays with Large Emission Current", Technical Digest of the International Electron Devices Meeting (IEDM), Wash., DC 10-13, 1995, Institute of Electrical and Electronic Engineers, pp. 393-396, XP 000624744.
K. Koga et al.: "New Structure Si Filed Emitter Arrays With Low Operation Voltage", 1995 IEEE International Conference On Systems, Man and Cybernetics, Vancouver, Oct. 22-25, 1995, vol. 1, Inst. of Electrical and Electronics Engineers, pp. 23-26, XP000585429.

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