Electric lamp and discharge devices – Discharge devices having a multipointed or serrated edge...
Reexamination Certificate
2005-05-03
2005-05-03
Patel, Nimeshkumar D. (Department: 2879)
Electric lamp and discharge devices
Discharge devices having a multipointed or serrated edge...
C313S495000, C313S496000, C313S497000, C313S547000, C313S549000, C313S561000, C313S562000, C445S024000, C445S025000, C445S041000, C417S048000, C417S049000, C417S050000, C417S051000
Reexamination Certificate
active
06888294
ABSTRACT:
The invention concerns a device comprising at least one field effect electron source within a sealed structure, which encompasses an internal space that contains a reducing gas whose purpose is to prevent oxidation of the emissive material of the electron source, whereby the reducing gas is a gas with the formula NxHywhere x=1 or 2 and y=3 or 4, and which is advantageously under a pressure of between 10−8and 10−1mbar. It also concerns manufacturing processes for such a device and apparatuses for implementing these processes.
REFERENCES:
patent: 3552818 (1971-01-01), Benda
patent: 5275840 (1994-01-01), Mikami et al.
patent: 5688708 (1997-11-01), Kato et al.
patent: 5788551 (1998-08-01), Dynka et al.
patent: 5964630 (1999-10-01), Slusarczuk et al.
patent: 6100627 (2000-08-01), Carretti et al.
patent: 6136670 (2000-10-01), Blalock et al.
patent: 6268288 (2001-07-01), Hautala et al.
patent: 6465952 (2002-10-01), Itoh et al.
patent: 0036681 (1981-09-01), None
patent: 0609815 (1994-08-01), None
patent: WO 9601492 (1996-01-01), None
patent: WO 9828769 (1998-07-01), None
Nikko Kinzoku KK, “Manufacture for Metal Material to be Produced by Melting, Apparatus Therefor and Tungsten-Series Metal Material”, Publication #09003559, Publication Date: Jul. 01, 1997, 1 page.
Boronat Jean-François
Levis Michel
Meyer Robert
Commissariat a l''Energie Atomique
Patel Nimeshkumar D.
Roy Sikha
Thelen Reid & Priest LLP
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