Field effects semiconductor devices

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 22, H01S 318

Patent

active

043319670

ABSTRACT:
In a field effect semiconductor device comprising a semi-insulator layer composed of a semiconductor material, an N conductivity type active layer made of the same semiconductor material and acting as a channel, spaced cathode and anode electrodes formed on the active layer, the cathode electrode being in ohmic contact with the active layer, and means for applying drive voltage across the cathode and anode electrodes for varying the electrons flowing through the active layer so as to vary output current, a P conductive region is provided beneath the anode electrode and extending through the active layer toward to or penetrating into the semiconductor layer.

REFERENCES:
patent: 3531698 (1970-09-01), Atalla
patent: 3585520 (1971-06-01), Yanai
patent: 3600705 (1971-08-01), Tantraporn
patent: 3701043 (1972-10-01), Zuleeg et al.
patent: 3991328 (1976-11-01), Upadhyayula

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Field effects semiconductor devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Field effects semiconductor devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Field effects semiconductor devices will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2079259

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.