Patent
1983-06-09
1984-06-19
Wojciechowicz, Edward J.
357 15, 357 16, 357 61, H01L 2980
Patent
active
044555644
ABSTRACT:
The invention relates to semiconductor devices of the transistor type operating at high frequencies.
In order to make the drain/source current characteristic linear with the voltage applied to the grid and in order to retain a construction technology which is compatible with existing technologies the invention provides an Al.sub.x Ga.sub.1-x As layer between the substrate and the active GaAs layer. A supplementary, highly doped, GaAs layer and a supplementary semi-insulating Al.sub.x Ga.sub.1-x As layer modify the source and drain access resistances and the output resistance.
Application to devices operating at ultra-high frequencies.
REFERENCES:
patent: 4157556 (1979-06-01), Decker et al.
Delagebeaudeuf Daniel
Nuyen Trong L.
"Thomson-CSF"
Wojciechowicz Edward J.
LandOfFree
Field effect transistor with a high cut-off frequency does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Field effect transistor with a high cut-off frequency, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Field effect transistor with a high cut-off frequency will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-415871