Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction
Reexamination Certificate
2006-12-05
2006-12-05
Ho, Tu-Tu (Department: 2818)
Active solid-state devices (e.g., transistors, solid-state diode
Thin active physical layer which is
Heterojunction
C257S020000, C257SE29193
Reexamination Certificate
active
07145169
ABSTRACT:
A field-effect transistor includes a silicon layer formed on an insulating film, a first-conductivity-type base and a second-conductivity-type source layers formed in the silicon layer being adjacent to each other, a second-conductivity-type drain layer formed in the silicon layer being separated from the source layer with the base layer being interposed therebetween, a gate-to-drain offset layer formed between the base and drain layers, having a resistance higher than that of the base layer, and a gate electrode formed on at least a surface of the base layer via a gate insulating film wherein the silicon layer in which the base layer is formed is a strained silicon layer.
REFERENCES:
patent: 6933518 (2005-08-01), Braithwaite et al.
Aizawa Yoshiaki
Kitagawa Mitsuhiko
Nishimura Takashi
Saso Ryujiro
Banner & Witcoff Ltd
Ho Tu-Tu
Kabushiki Kaisha Toshiba
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