Field effect transistor semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

Reexamination Certificate

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C257S012000, C257S020000, C257SE21395, C257SE21399

Reexamination Certificate

active

07078743

ABSTRACT:
A semiconductor device has: a buffer layer formed on a conductive substrate and made of AlxGa1-xN with a high resistance; an element-forming layer formed on the buffer layer, having a channel layer, and made of undoped GaN and N-type AlyGa1-yN; and a source electrode, a drain electrode and a gate electrode which are selectively formed on the element-forming layer. The source electrode is filled in a through hole provided in the buffer layer and the element-forming layer, and is thus electrically connected to the conductive substrate.

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patent: WO 00/48248 (2000-08-01), None
Masumi Fukuda et al.; “Basis for GaAs Field Effect Transistor”;The Institute of Electronics, Information and Engineers;c. 1992; p. 214-217.
Yuji Ando et al.; “Characterization of High Breakdown Voltage AlGaN/GaN Heterojunction FETs with a Field Plate Gate”;Photonic abd Wireless Devices Research Laboratories;c. 2002; pp. 29-34.

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