Patent
1986-12-19
1988-02-23
James, Andrew J.
357 51, H01L 2980, H01L 2956
Patent
active
047274042
ABSTRACT:
A field effect transistor for high-frequency applications includes, on a monocrystalline semi-insulating substrate, a thin active n-doped layer of a material having a high electron mobility, on whose surface are deposited two ohmic contacts forming the source and drawing contact regions of the transistor, between which a metallic contact constitutes a gate electrode of the Schottky type. According to the invention, the transistor is characterized in that a dielectric layer is deposited on the active layer between the source and gate electrodes on the one hand and between the gate and drain electrodes on the other hand, and in that the metallic layer constituting the ohmic contacts is continuously prolonged on this dielectric layer without causing a short-circuit with the gate.
REFERENCES:
patent: 3372069 (1968-03-01), Bailey et al.
patent: 3675313 (1972-07-01), Driver et al.
patent: 3763408 (1973-10-01), Kano et al.
patent: 3920861 (1975-11-01), Dean
patent: 4202003 (1980-05-01), Darley et al.
patent: 4338616 (1982-07-01), Bol
patent: 4375643 (1983-03-01), Yeh et al.
Biren Steven R.
Crane Sara W.
James Andrew J.
Mayer Robert T.
U.S. Philips Corporation
LandOfFree
Field effect transistor of the MESFET type for high frequency ap does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Field effect transistor of the MESFET type for high frequency ap, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Field effect transistor of the MESFET type for high frequency ap will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-605365