Field effect transistor and method of fabricating

Details Field effect transistor and method of fabricating Field effect transistor and method of fabricating

1992-12-30

1994-11-29

James, Andrew J.

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Junction field effect transistor

257263, 257269, 257270, H01L 2701, H01L 2900, H01L 2978

Patent

active

053692942

ABSTRACT:
A junction field effect transistor, specifically a static induction transistor. The N-type source regions are formed as two zones. First, relatively lightly doped first zones are formed by ion-implanting doping material relatively deeply into the semiconductor material. Then relatively heavily doped second zones are formed by ion-implanting doping material to a relatively shallow depth within the first zones to leave portions of the first zones interposed between the second zones and the remainder of the semiconductor material. The resulting devices exhibit reduced gate-drain junction capacitance at low drain bias voltages thereby improving device capacitance linearity.

REFERENCES:
patent: 4223328 (1980-09-01), Terasawa et al.
patent: 4477963 (1984-10-01), Cogan
patent: 4551909 (1985-11-01), Cogan et al.
patent: 4611384 (1986-09-01), Bencuya et al.
patent: 4751556 (1988-06-01), Cogan et al.
patent: 4983536 (1991-01-01), Bulat et al.
patent: 5013674 (1991-05-01), Bergemont
patent: 5066603 (1991-11-01), Bulat et al.

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