Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Reexamination Certificate
2011-01-11
2011-01-11
Fahmy, Wael M (Department: 2891)
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Amorphous semiconductor material
C257S056000, C257S059000, C257S062000, C257S072000, C257SE29083, C257SE29092, C257SE29101
Reexamination Certificate
active
07868326
ABSTRACT:
A novel field-effect transistor is provided which employs an amorphous oxide. In an embodiment of the present invention, the transistor comprises an amorphous oxide layer containing electron carrier at a concentration less than 1×10−18/cm3, and the gate-insulating layer is comprised of a first layer being in contact with the amorphous oxide and a second layer different from the first layer.
REFERENCES:
patent: 5858120 (1999-01-01), Nakagawa et al.
patent: 6075256 (2000-06-01), Kaifu et al.
patent: 7205640 (2007-04-01), Yoshioka et al.
patent: 2003/0218222 (2003-11-01), Wager
patent: 2004/0084736 (2004-05-01), Harada
patent: 2004/0127038 (2004-07-01), Carcia et al.
patent: 2005/0173734 (2005-08-01), Yoshioka et al.
patent: 2005/0199959 (2005-09-01), Chiang et al.
patent: 2006/0108529 (2006-05-01), Saito et al.
patent: 2006/0110867 (2006-05-01), Yabuta et al.
patent: 2006/0113536 (2006-06-01), Kumomi et al.
patent: 2006/0113565 (2006-06-01), Abe et al.
patent: 1 443 130 (2004-08-01), None
patent: 05-251705 (1993-09-01), None
patent: 08-032094 (1996-02-01), None
patent: 2000-44236 (2000-02-01), None
patent: 2002-289859 (2002-04-01), None
patent: 2003-298062 (2003-10-01), None
patent: 2004-103957 (2004-04-01), None
patent: WO 03/098699 (2003-11-01), None
patent: WO 2004/038757 (2004-05-01), None
patent: WO 2005/088726 (2005-09-01), None
patent: 2005093846 (2005-10-01), None
patent: 2005093847 (2005-10-01), None
patent: 2005093848 (2005-10-01), None
patent: 2005093849 (2005-10-01), None
patent: 2005093850 (2005-10-01), None
patent: 2005093851 (2005-10-01), None
patent: 2005093852 (2005-10-01), None
patent: WO 2006/051993 (2006-05-01), None
patent: WO 2006/051994 (2006-05-01), None
patent: WO 2006/051995 (2006-05-01), None
Fortunato, Wide bandgap high mobility ZnO thin film transistors produced at room temperature, Appl. Phys. Lee. 85, 2004, 2541-2543.
Narushima, A p-type amorphous oxide semiconductor and room temperature fabrication of amorphous oxide p-n heterojunction diode, Adv. Mat. 2003, 15, p. 1409-1413.
“Carrier Transport in Transparent Amorphous Oxide Semiconductor InGaZnO4”, Nomura et al.; Preprint 31a-ZA-6 of 51th Meeting of Union of Applied Phys. Soc. , Mar. 2004, Tokyo University of Technology.
“Room Temperature Fabrication and Carrier Transport . . . (>10 cm2/Vs)”, Kamiya et al. ; Preprint 1a-F-5 of 65thMeeting of Appl. Phys. Soc., Sep. 2004, Tohoku Gakuen University.
Nomura et al., “Room-temperature Fabrication of Transparent Flexible Thin-film Transistors Using Amorphous Oxide Semiconductors,”Nature, vol. 432, 488-492 (2004).
Takagi et al., “Carrier Transport and Electronic Structure in Amorphous Oxide Semiconductor, a-InGaZnO4,”Thin Solid Films, vol. 486, 38-41 (2005).
Nomura et al., “Thin-Film Transistor Fabricated in Single-Crystalline Transparent Oxide Semiconductor,”Science, vol. 300, 1269-1272 (2003).
K. Nomura et al., “Electron transport in InGaO3(ZnO)m(m=integer) studied using single-crystalline thin film and transparent MISFETs,” Thin Solid Films, 445, pp. 322-326 (2003).
M. Orita et al., “Amorphous transparent conductive oxide InGaO3(Zno)m(m<=4): a Zn 4s conductor,” Philosophical Magazine B, 81, No. 5, pp. 501-515 (2001).
Canadian Office Action issued on Jan. 6, 2010, in the counterpart Canadian Application No. 2,585,071.
International Preliminary Report on Patentability mailed Nov. 14, 2006, in the counterpart PCT application No. PCT/JP2005/020982.
Hosono Hideo
Kamiya Toshio
Nakagawa Katsumi
Nomura Kenji
Sano Masafumi
Canon Kabushiki Kaisha
Fahmy Wael M
Fitzpatrick ,Cella, Harper & Scinto
Tokyo Institute of Technology
Yang Minchul
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