Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor
Patent
1994-06-01
1995-09-05
Prenty, Mark V.
Active solid-state devices (e.g., transistors, solid-state diode
Heterojunction device
Field effect transistor
257280, H01L 2702
Patent
active
054480868
ABSTRACT:
A field effect transistor comprises a semiconductor substrate, a first layer made of a semiconductor having an electron affinity and the first layer being formed on the semiconductor substrate, a second layer made of material having electron affinity smaller than that of the first layer formed on the first layer, a length of the second layer being longer than that of the first layer, source and drain regions formed on the semiconductor substrate, the source and drain regions being separated through a lamination of the first and second layer, a gate electrode formed on the second layer, a gate length of the gate electrode being shorter than that of the second layer and being shorter than that of the first layer and the gate electrode being separated from the source and drains region through the second layer.
REFERENCES:
By P. Solomon et al., "Low Resistance Ohmic Contacts to two-dimensional electron-gas structures by selective MOVPE", IEEE, 1989, pp. 405-408.
NEC Corporation
Prenty Mark V.
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