Field effect transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257280, H01L 2702

Patent

active

054480868

ABSTRACT:
A field effect transistor comprises a semiconductor substrate, a first layer made of a semiconductor having an electron affinity and the first layer being formed on the semiconductor substrate, a second layer made of material having electron affinity smaller than that of the first layer formed on the first layer, a length of the second layer being longer than that of the first layer, source and drain regions formed on the semiconductor substrate, the source and drain regions being separated through a lamination of the first and second layer, a gate electrode formed on the second layer, a gate length of the gate electrode being shorter than that of the second layer and being shorter than that of the first layer and the gate electrode being separated from the source and drains region through the second layer.

REFERENCES:
By P. Solomon et al., "Low Resistance Ohmic Contacts to two-dimensional electron-gas structures by selective MOVPE", IEEE, 1989, pp. 405-408.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Field effect transistor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Field effect transistor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Field effect transistor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-473941

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.