Field effect transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

Reexamination Certificate

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Details

C257S195000, C257S192000, C257S280000

Reexamination Certificate

active

07456444

ABSTRACT:
A field effect transistor according to an embodiment of the invention includes: a semiconductor substrate; a channel layer of a first conductivity type formed on the semiconductor substrate; and a semiconductor layer of a second conductivity type that is buried in a recess structure formed in a semiconductor layer on the channel layer and connected with a gate electrode, in which the recess structure is formed using a recess stopper layer containing In, a semiconductor layer that contacts the bottom of the semiconductor layer of the second conductivity type does not contain In, and the uppermost semiconductor layer among semiconductor layers that contact a side surface of the semiconductor layer of the second conductivity type does not contain In.

REFERENCES:
patent: 5504353 (1996-04-01), Kuzuhara
patent: 5739558 (1998-04-01), Ishida et al.
patent: 5923951 (1999-07-01), Goossen et al.
patent: 5952672 (1999-09-01), Kikkawa
patent: 6025613 (2000-02-01), Bito et al.
patent: 6207976 (2001-03-01), Takahashi et al.
patent: 6605831 (2003-08-01), Inai et al.
patent: 6624440 (2003-09-01), Bito et al.
patent: 6936870 (2005-08-01), Nishihori et al.
patent: 2001/0019131 (2001-09-01), Kato et al.
patent: 2004/0104404 (2004-06-01), Bito
patent: 2001-250939 (2001-09-01), None

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