Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Junction field effect transistor
Reexamination Certificate
2008-01-22
2008-01-22
Wilczewski, Mary (Department: 2822)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Junction field effect transistor
C257S487000, C257SE29242
Reexamination Certificate
active
10544017
ABSTRACT:
On an SiC single crystal substrate, an electric field relaxation layer and a p− type buffer layer are formed. The electric field relaxation layer is formed between the p− type buffer layer and the SiC single crystal substrate to contact SiC single crystal substrate. On the p− type buffer layer, an n type semiconductor layer is formed. On the n type semiconductor layer, a p type semiconductor layer is formed. In the p type semiconductor layer, an n+ type source region layer and an n+ type drain region layer are formed separated by a prescribed distance from each other. At a part of the region of p type semiconductor layer between the n+ type source region layer and the n+ type drain region layer, a p+ type gate region layer is formed.
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S. T. Allen et al., “Frequency and power performance of microwave SiE FET's” Inst. Phys. Conf. Ser., No. 142, Chapter 4, IOP Publishing Ltd, 1995 pp. 761-764.
Fujikawa Kazuhiro
Harada Shin
Kimoto Tsunenobu
Matsunami Hiroyuki
Fasse W. F.
Fasse W. G.
Patton Paul E
Sumitomo Electric Industries Ltd.
Wilczewski Mary
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