Field effect thin film transistor and static-type semiconductor

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257903, 257 66, 257336, 257369, 257351, 257338, 365181, H01L 2978

Patent

active

053828070

ABSTRACT:
A structure of a thin film transistor capable of reducing the power consumption in the waiting state and stabilizing the data holding characteristic in application of the thin film transistor as a load transistor in a memory cell in a CMOS-type SRAM is provided. A gate electrode is formed of a polycrystalline silicon film on a substrate having an insulating property. A gate insulating film is formed on the gate electrode. A polycrystalline silicon film is formed on the gate electrode with the gate insulating film interposed therebetween. Source/drain regions including a region of low concentration and a region of high concentration are formed in one and another regions of the polycrystalline silicon film separated by the gate electrode. Thus, the thin film transistor is formed. The thin film transistor is applied to p-channel MOS transistors serving as load transistors in a memory cell of a CMOS-type SRAM. P-channel MOS transistors are connected to n-channel MOS transistors serving as driver transistors in the memory cell. The n-channel MOS transistors are formed in a p-type well region, and the p-channel MOS transistors are formed on an interlayer insulating film on the n-channel MOS transistors.

REFERENCES:
patent: 4555721 (1985-11-01), Bansal et al.
patent: 5057898 (1991-10-01), Adan et al.
patent: 5134581 (1992-07-01), Ishibashi et al.
patent: 5194749 (1993-03-01), Meguro et al.
patent: 5208476 (1993-05-01), Inoue
patent: 5214295 (1993-05-01), Manning
"Effects of Lightly Doped Drain Structure with Optimum Ion Dose on p-Channel MOSFET's", IEEE Trans. on Electron Devices, by T. Kaga and Y. Sakai, vol. 35 No. 12, 1988, pp. 2384-2389.
"A 25 .mu.m.sub.2 New Poly-Si PMOS Load (PPL) SRAM Cell Having Excellent Soft Error Immunity", IEDM, 1988, by T. Yamahaka, et al, pp. 48-51.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Field effect thin film transistor and static-type semiconductor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Field effect thin film transistor and static-type semiconductor , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Field effect thin film transistor and static-type semiconductor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-748632

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.