1976-05-13
1977-03-29
Wojciechowicz, Edward J.
357 41, 357 45, 357 46, 357 55, 357 68, H01L 2980, H01L 2702, H01L 2710, H01L 2906
Patent
active
040152782
ABSTRACT:
A high power field effect semiconductor device in which the gate length per given area of a semiconductor substrate is great and a channel is formed to extend from the main surface of the semiconductor substrate toward the other main surface to make current density as uniform as possible to thereby provide a high output power and which has a construction to allow ease in the attachment of electrodes.
REFERENCES:
patent: 3681220 (1972-08-01), Chizinsky
patent: 3764865 (1973-10-01), Napoli et al.
patent: 3783349 (1974-01-01), Beasom
Fujitsu Ltd.
Wojciechowicz Edward J.
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