Field effect real space transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

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Details

257273, 257194, H01L 29161, H01L 29205

Patent

active

053230302

ABSTRACT:
The present Field Effect Real Space Transistor, or FERST, is a four terminal device with S, G, C, and D representing the source, gate, collector, and drain, respectively. The S, G, and D terminals can be likened to those of the MODFET. The collector name is borrowed from other real space transfer devices. Surrounding the entire device is an oxygen implant isolation. The source and drain ohmic contacts penetrate to the 150 .ANG. GaAs channel while the collector ohmic contact does not penetrate due to its position upon an elevated submesa. AlGaAs layers are used as etch stops during processing of the device and a Schottky barrier gate is placed on an undoped layer. Channel carriers are provided by modulation doping the lower barrier of the channel. An Al.sub.0.35 Ga.sub.0.65 As layer on the upper channel side is used as a real space transfer barrier. In operation and under appropriate bias conditions, real space transfer occurs across this upper barrier and into the collector. Voltage is applied to the device between the drain and source which heats up electrons in the channel to an energized state. Field effect control by the gate then adjusts the voltage distribution throughout the device due to both ohmic voltage drops and the variation in channel conductance under the gate.

REFERENCES:
patent: 5111255 (1992-05-01), Kiely et al.
patent: 5157467 (1992-10-01), Fujii
patent: 5223724 (1993-06-01), Green, Jr.
Luryi et al, "Charge Injection Transistor Based on Real-Space Hot-Electron ransfer", IEEE Transactions on Electron Devices, vol. ED-31, No. 6, Jun. 1984.

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