Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Junction field effect transistor
Reexamination Certificate
2011-03-08
2011-03-08
Menz, Douglas M (Department: 2891)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Junction field effect transistor
C257S401000
Reexamination Certificate
active
07902575
ABSTRACT:
The invention relates to a field-effect microelectronic device, as well as the method of production thereof. The device includes a substrate as well as at least one improved structure capable of forming one or more transistor channels. This structure, formed by a plurality of bars stacked on the substrate, can make it possible to save space in the integration of field-effect transistors as well as to improve the performance thereof.
REFERENCES:
patent: 5675164 (1997-10-01), Brunner et al.
patent: 5780911 (1998-07-01), Park et al.
patent: 5965914 (1999-10-01), Miyamoto
patent: 6127702 (2000-10-01), Yamazaki et al.
patent: 6355532 (2002-03-01), Seliskar et al.
patent: 6413802 (2002-07-01), Hu et al.
patent: 6475890 (2002-11-01), Yu
patent: 6562665 (2003-05-01), Yu
patent: 6921700 (2005-07-01), Orlowski et al.
patent: 7002207 (2006-02-01), Kim et al.
patent: 2002/0093053 (2002-07-01), Chan et al.
patent: 2005/0035415 (2005-02-01), Yeo et al.
Kim, Sung-Min et al., “A Novel MBC (Multi-Bridge-Channel) MOSFET: Fabrication Technologies and Characteristics”, Silicon Nanoelectrics Workshop, pp. 18-19, 2003.
Borel Stephan
Ernst Thomas
Commissariat a l''Energie Atomique
Menz Douglas M
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
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