Field curvature correction utilizing smoothly curved chuck for s

Details Field curvature correction utilizing smoothly curved chuck for s Field curvature correction utilizing smoothly curved chuck for s

1997-07-17

2000-02-15

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, G03F 900

Patent

active

060250992

ABSTRACT:
The layer of photoresist on a substrate to be exposed is deformed to approximate the shape of the region of best focus of the image to be projected thereon. The region of best focus is projected into a central region of the resist throughout the exposure field of the image. The deformation is accomplished by conforming the substrate with vacuum to a smoothly curved or spherically curved, permanent, rigid surface in a substrate chuck holding the substrate. The substrate chuck is mounted for motion on a substrate stage so that multiple exposure fields may be formed in the resist.

REFERENCES:
patent: 4609285 (1986-09-01), Samuels
patent: 4788577 (1988-11-01), Akiyama et al.
patent: 5184176 (1993-02-01), Unno et al.

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