Radiant energy – With charged particle beam deflection or focussing – Magnetic lens
Patent
1996-09-11
1999-02-09
Berman, Jack I.
Radiant energy
With charged particle beam deflection or focussing
Magnetic lens
H01J 3712
Patent
active
058698388
ABSTRACT:
An electrostatic lens system consisting of several electrodes and a novel method of making same. The invention relates to a lithography apparatus that includes a field composable lens where at least one lens electrode has a novel structure, said structure comprising an outer support structure, an insulating intermediate part and a conductive inner part composed of a number of segment-like subelectrodes that can be individually powered, if necessary, slightly differently to produce desired individual electrostatic subfields to be superimposed to the lens field. With the field composable lens design, it has been successfully demonstrated that a number of shape and alignment errors of lens components can be corrected by supplying slightly different voltages to individual subelectrodes, thus optimizing the overall lens performance (in view of its optical properties). The lens components may be manufactured on less expensive and readily available conventional precision machinery rather than expensive and rarely available high precision equipment.
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A. Chalupka et al., "Novel Electrostatic Column for Ion Projection Lithography," J. Vac. Sci. Technol., B vol. 12, No. 6, Nov/Dec 1994, pp. 3513-3517.
W. Finkelstein et al., "Part 1: Overcoming Perceptions; Ion Beaming Lithography--A paradigm Shift in Technology," Semiconductor International, May 1995, pp. 55,56 & 58.
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M.G.R. Thomas et al., "Lens and Deflector Design for Microcolumns," J. Vac. Sci. Technol. B, vo. 13 No. 6, Nov/Dec 1995, pp. 2445-2449.
Advanced Lithography Group
Berman Jack I.
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