Fidelity enhancement of lithographic and reactive-ion-etched ima

Details Fidelity enhancement of lithographic and reactive-ion-etched ima Fidelity enhancement of lithographic and reactive-ion-etched ima

1996-05-30

1998-04-14

Trans, Vincent N.

Boots, shoes, and leggings

364488, 2504923, 25049222, 2504922, G03F 700, H01J 37304

Patent

active

057400687

ABSTRACT:
A method for performing optical proximity correction is disclosed that not only limits the optical proximity correction to electrically relevant structures, but also improves the accuracy of the corrections by processing individual feature edges, and minimizes the mask manufacturing impacts by avoiding the introduction of jogs into the design. Critical edge regions of the relevant electrical structures are analyzed, sorted and manipulated to receive optical proximity corrections.

REFERENCES:
patent: 4812962 (1989-03-01), Witt
patent: 4895780 (1990-01-01), Nissan-Cohen et al.
patent: 5008553 (1991-04-01), Abe
patent: 5086398 (1992-02-01), Moriizumi
patent: 5159201 (1992-10-01), Frei
patent: 5182718 (1993-01-01), Harafuji et al.
patent: 5208124 (1993-05-01), Sporon-Fiedler et al.
patent: 5210696 (1993-05-01), Yano
patent: 5242770 (1993-09-01), Chen et al.
patent: 5253182 (1993-10-01), Suzuki
patent: 5278421 (1994-01-01), Yoda et al.
patent: 5432714 (1995-07-01), Chung et al.
patent: 5481472 (1996-01-01), Chung et al.
patent: 5526279 (1996-06-01), Dick
patent: 5553273 (1996-09-01), Liebmann
patent: 5553274 (1996-09-01), Liebmann
patent: 5631110 (1997-05-01), Shioiri et al.
patent: 5657235 (1997-08-01), Liebmann et al.
patent: 5663017 (1997-09-01), Schinella et al.
patent: 5663893 (1997-09-01), Wampler et al.

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