FET having epitaxial silicon growth

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S057000, C257S063000, C257S066000, C257S192000, C257S213000, C257S288000, C257SE21619, C257SE21634

Reexamination Certificate

active

07119369

ABSTRACT:
A field-effect transistor has a channel region in a bulk semiconductor substrate, a first source/drain region on a first side of the channel region, a second source/drain region on a second side of the channel region, and an extension of epitaxial monocrystalline material formed on the bulk semiconductor substrate so as to extend away from each side of the channel region.

REFERENCES:
patent: 5481126 (1996-01-01), Subramanian et al.
patent: 5908313 (1999-06-01), Chau et al.
patent: 6156589 (2000-12-01), Noble
patent: 6180494 (2001-01-01), Manning
patent: 6274894 (2001-08-01), Wieczorek et al.
patent: 6274913 (2001-08-01), Brigham et al.
patent: 6300219 (2001-10-01), Doan et al.
patent: 6342421 (2002-01-01), Mitani et al.
patent: 6358798 (2002-03-01), Chen
patent: 6388294 (2002-05-01), Radens et al.
patent: 6391726 (2002-05-01), Manning
patent: 6541343 (2003-04-01), Murthy et al.
Jacob Millman, Microelectronics: Digital and Analog Circuits and Systems, McGraw-Hill, 1979, pp. 289, 295.
S. Wolf et al, “Silicon Epitaxial Film Growth,”Silicon Processing for the VLSI Era, vol. 1, 1986, pp. 124-160.
U.S. Appl. No. 09/713,844, filed Nov. 15, 2000, Abbott et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

FET having epitaxial silicon growth does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with FET having epitaxial silicon growth, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and FET having epitaxial silicon growth will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3686920

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.