Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction
Reexamination Certificate
2006-05-26
2010-06-22
Andújar, Leonardo (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Thin active physical layer which is
Heterojunction
C257S759000, C257S760000
Reexamination Certificate
active
07741633
ABSTRACT:
The present invention is related to a ferroelectric storage medium for ultrahigh density data storage device and a method for fabricating the same. A supercell having high anisotropy is formed by controlling crystal structure and symmetry of unit structure (supercell) of artificial lattice by using an ordered alignment of predetermined ions having orientation of (perpendicular) deposition direction. Unit atomic layers of oxides having different polarization characteristic are deposited so that the supercell itself shows electric polarization having only two, upward and downward directions as one block of supercell having single-directional polarization. Oxide artificial lattices can be formed so as to have solely 180 degree domain structure, thus a single electric domain having improved anisotropic characteristic can be formed, thereby allowing capability of ultrahigh density data storage and long term data retention.
REFERENCES:
patent: 6747357 (2004-06-01), Lee et al.
patent: 1020030070295 (2003-03-01), None
patent: 1020030070295 (2003-08-01), None
Cho, Yasuo et al, “Realization of 10 Tbit/in.2 memory density and subnanosecond domain switching time in ferroelectric data storage”, Applied Physics Letters, Dec. 2, 2005.
Paurch, P. et al, “Nanoscale control of ferroelectric polarization and domain size in epitaxial Pb(Zr 0.2Ti0.8)O3 thin films”, Applied Physics Letters, Jul. 23, 2001, pp. 530-532.
Choi Taekjib
Lee Jaichan
Andújar Leonardo
Schmeiser Olsen & Watts LLP
Sungkyunkwan University Foundation For Corporate Collaboration
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