Ferroelectric oxide artificial lattice, method for...

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S759000, C257S760000

Reexamination Certificate

active

07741633

ABSTRACT:
The present invention is related to a ferroelectric storage medium for ultrahigh density data storage device and a method for fabricating the same. A supercell having high anisotropy is formed by controlling crystal structure and symmetry of unit structure (supercell) of artificial lattice by using an ordered alignment of predetermined ions having orientation of (perpendicular) deposition direction. Unit atomic layers of oxides having different polarization characteristic are deposited so that the supercell itself shows electric polarization having only two, upward and downward directions as one block of supercell having single-directional polarization. Oxide artificial lattices can be formed so as to have solely 180 degree domain structure, thus a single electric domain having improved anisotropic characteristic can be formed, thereby allowing capability of ultrahigh density data storage and long term data retention.

REFERENCES:
patent: 6747357 (2004-06-01), Lee et al.
patent: 1020030070295 (2003-03-01), None
patent: 1020030070295 (2003-08-01), None
Cho, Yasuo et al, “Realization of 10 Tbit/in.2 memory density and subnanosecond domain switching time in ferroelectric data storage”, Applied Physics Letters, Dec. 2, 2005.
Paurch, P. et al, “Nanoscale control of ferroelectric polarization and domain size in epitaxial Pb(Zr 0.2Ti0.8)O3 thin films”, Applied Physics Letters, Jul. 23, 2001, pp. 530-532.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ferroelectric oxide artificial lattice, method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ferroelectric oxide artificial lattice, method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ferroelectric oxide artificial lattice, method for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4168283

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.