Semiconductor device manufacturing: process – Having magnetic or ferroelectric component
Reexamination Certificate
2008-02-13
2011-11-29
Nguyen, Cuong Q (Department: 2811)
Semiconductor device manufacturing: process
Having magnetic or ferroelectric component
C438S253000
Reexamination Certificate
active
08067250
ABSTRACT:
A method of manufacturing a ferroelectric memory device includes: forming a hydrogen barrier film which covers a ferroelectric capacitor including a lower electrode, a ferroelectric film, and an upper electrode, wherein a thickness of an area of the hydrogen barrier film provided on the upper electrode is made greater than a thickness of an area of the hydrogen barrier film provided on a sidewall of the ferroelectric capacitor by forming the area of the hydrogen barrier film provided on the upper electrode in a plurality of layers.
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Patent Abstracts of Japan for JP 2001-044375.
Tagawa Teruo
Tamura Hiroaki
Harness & Dickey & Pierce P.L.C.
Nguyen Cuong Q
Seiko Epson Corporation
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