Chemical apparatus and process disinfecting – deodorizing – preser – Analyzer – structured indicator – or manipulative laboratory... – Automatic analytical monitor and control of industrial process
Reexamination Certificate
2008-01-23
2011-10-11
Ramdhanie, Bobby (Department: 1774)
Chemical apparatus and process disinfecting, deodorizing, preser
Analyzer, structured indicator, or manipulative laboratory...
Automatic analytical monitor and control of industrial process
Reexamination Certificate
active
08034291
ABSTRACT:
An apparatus for introducing a reductant into an exhaust system is described. The apparatus includes a controller that generates a resulting dosing command used as an instruction to release an amount of reductant into the exhaust system. The controller includes a feedback control module that generates a weighing factor. The weighing factor is configured to be applied to a lower limit dosing command and configured to be applied to an upper limit dosing command, where the lower and upper limit dosing commands converted by the weighing factor are used by the controller to generate the resulting dosing command.
REFERENCES:
patent: 4473536 (1984-09-01), Carberg et al.
patent: 2007/0220865 (2007-09-01), Cunningham et al.
patent: 2000-220438 (2000-08-01), None
patent: 10-2003-0076976 (2003-09-01), None
International Search Report of PCT/US2009/030738, dated Aug. 25, 2009.
Written Opinion of the International Searching Authority of PCT/US2009/030798, dated Aug. 25, 2009.
Ma Hongbin
McDaniel Mickey R.
Ogunleye Hakeem
Qi Baohua
Xi Clyde
Cummins Filtration IP Inc.
Hamre Schumann Mueller & Larson P.C.
Ramdhanie Bobby
LandOfFree
Feedback control in selective catalytic reduction does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Feedback control in selective catalytic reduction, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Feedback control in selective catalytic reduction will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4269506