Feedback control for vacuum deposition apparatus

Details Feedback control for vacuum deposition apparatus Feedback control for vacuum deposition apparatus

1978-04-28

1979-09-04

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192P, 204298, 118665, 118715, 427 39, 250565, 250573, C23C 1500

Patent

active

041667840

ABSTRACT:
Method and apparatus for controlling vacuum deposition of a thin film onto a substrate, wherein the vacuum deposition produces a glow discharge. The glow discharge is monitored and light therefrom is converted to an electrical signal which is compared to a preset reference signal and used to optimize thin film properties by controlling deposition parameters such as current between electrodes or the supply of gas to a reactive sputtering apparatus. The overall intensity of the glow discharge, or the intensity of certain wavelengths, or the ratio of certain wavelength intensities may be monitored. The time derivative of the electrical signal may be taken to quicken response to light changes. The method and apparatus of the present invention are particularly applicable to reactive sputtering. As an alternative embodiment in reactive sputtering, cathode voltage may be monitored instead of the light.

REFERENCES:
patent: 3738926 (1973-06-01), Westwood et al.
patent: 4124474 (1978-11-01), Bomchil et al.
J. E. Greene et al., "Glow Discharge Optical Spectroscopy for Monitoring Sputter Deposited Film Thickness", J. Vac. Sci. Technol., vol. 10, pp. 1144-1149, (1973).

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