Feature identification for metrological analysis

Details Feature identification for metrological analysis Feature identification for metrological analysis

2011-04-26

2011-04-26

Young, Christopher G (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C382S145000, C382S149000

Reexamination Certificate

active

07932004

ABSTRACT:
A method for selecting a set of features for monitoring a lithography process using a reticle, by identifying a set of candidate features, defining control regions around the candidate features, performing substrate level analysis using the reticle with different settings for the lithography process, determining which of the candidate features are most changed by the different settings, ranking the candidate features according to how much they are changed, and selecting the test set of features from those candidate features that are most changed.

REFERENCES:
patent: 6094256 (2000-07-01), Grodnensky et al.
patent: 7642019 (2010-01-01), Kim
patent: 2008/0131796 (2008-06-01), Werner et al.

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