Feature biassing and absorptive phase-shifting techniques to imp

Details Feature biassing and absorptive phase-shifting techniques to imp Feature biassing and absorptive phase-shifting techniques to imp

1992-04-23

1994-02-22

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430396, G03F 900

Patent

active

052885690

ABSTRACT:
Feature biassing applied to phase shifting masks is used to improve the exposure latitude and depth of focus of an optical projection imaging system. Making the phase shifters absorptive facilitates a phase shifting mask system for arbitrary layouts. Combining phase shifters of different levels of absorption further enhance the improvements. Even more enhancement can be gained by combining biassing with absorption levels.

REFERENCES:
patent: 3743842 (1973-07-01), Smith et al.
patent: 4360586 (1982-11-01), Flanders et al.
patent: 4890309 (1989-12-01), Smith et al.
patent: 5045417 (1991-09-01), Okamoto
Burn Jeng Lin, "Partially Coherent Imaging in Two Dimensions and the Theoretical Limits of Projection Printing in Microfabrication" IEEE Transactions on Electron Devices, vol. ED-27, No. 5, pp. 931-937 (May 1980).
Burn Jeng Lin, "A Comparision of Projection and Proximity Printings--From UV to X-Ray"; Microelectronic Engineering 11 (1990) pp. 137-145.

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