Patent
1983-10-03
1991-06-11
LaRoche, Eugene R.
350393, G02F 101
Patent
active
050227424
ABSTRACT:
A solid state shutter for blocking EMP is disclosed. The shutter includes thin films of amorphous semiconductor material fro the Group V or VI elements deposited on a silicon dioxide substrate. An antenna senses incident EMP causing a trigger circuit to apply a voltage across the thin films. The thin films switch from a state of high resistance to a state of low resistance for blocking passage of the EMP.
REFERENCES:
patent: 1632069 (1927-06-01), Hartley
patent: 3245315 (1966-04-01), Marks et al.
patent: 3266370 (1966-08-01), Marks et al.
patent: 3271578 (1966-09-01), Bockemuehl
patent: 3305863 (1967-02-01), Jacobs
patent: 3475609 (1969-10-01), Schneider
patent: 3656836 (1972-04-01), De Cremoux
patent: 3695747 (1972-10-01), Maldonado
patent: 3902061 (1975-08-01), Harris
patent: 3980397 (1976-09-01), Judd et al.
Smith et al, "Aspects of Threshold Switching", Electrocomponent Science & chnology, 12-1974, pp. 137-139.
Chang et al, "Amorphous Semiconductor Light Modulator" IBM Tech. Disc. Bull., 5-1970, pp. 2236.
Kienzle et al, "Optical Properties of Tl.sub.2 SeAs.sub.2 Te.sub.3 Amorphous Chalcogenide Glass in the Range 2 to 10.6 .mu.m," JOSA vol. 6, 1978, pp. 1396.
Kolomiets et al, "Changes in the Optical Properties of Amorphous (As.sub.2 Se.sub.3).sub.1-x (As.sub.2 Te.sub.3).sub.x Films under the Action of Electric Fields & Optical Excitation", Sov. Phys. Semicond. 8-1978, pp. 938-940.
LaRoche Eugene R.
The United States of America as represented by the Secretary of
Walden Kenneth E.
LandOfFree
Fast shutter for protection from electromagnetic radiation does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fast shutter for protection from electromagnetic radiation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fast shutter for protection from electromagnetic radiation will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-779014