Fast luminescent silicon

Details Fast luminescent silicon Fast luminescent silicon

1998-06-05

2000-02-22

Koslow, C. Melissa

Compositions

Inorganic luminescent compositions

Compositions containing halogen; e.g., halides and oxyhalides

2523014R, 252582, 252584, 2525011, 502240, 502 64, 502 63, 423718, 423702, 423704, 423335, C09K 1156

Patent

active

060276665

ABSTRACT:
There are provided mesoporous silica materials containing in their pores stabilized clusters of silicon atom, of size 2 nanometers or less, and capable of photoluminescence to emit fast photons. They are prepared by chemical vapor deposition of silicon or a silicon precursor such as disilane, under soft conditions such as temperature of 100-150.degree. C., into the mesopores of silicate films which have mesoporous channels prepared by growth of the films using a template to control their sizes, but without removing the template residues from the films prior to the chemical vapor deposition. The template residues serve to limit the size of the silicon clusters which conform. The use of the soft conditions on CVD retains the template residues in an intact, substantially unchanged form. The resultant films have clusters of silicon, of 2 nanometer size or less, anchored to the mesopores, and air stable, so that they can be used in optoelectronic devices in conjunction with standard silicon semiconductors.

REFERENCES:
patent: 5348687 (1994-09-01), Beck et al.
Yang, H., Coombs, N., Sokolov I. and Ozin, G.A. "Nature", vol. 381, Jun. 13, 1996, pp. 589-592.
Chomski et al, "New Forms of Luminescent Silicon:Silicon-Silica Composite Mesostructures", Cgemical Vapor Deposition, vol. 2, No. 1, pp. 8-13, Jan. 1996.

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