Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-11-14
1994-11-08
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430193, 534557, G03F 7023, G03F 730
Patent
active
053625994
ABSTRACT:
Positive photoresist compositions and methods using the photoresist compositions for making submicron patterns in the production of semiconductor devices are disclosed. The photoresists contain sensitizers that are mixed naphthoquinonediazide 4- and 5- sulfonic acid esters of bis and tris(mono, di and trihydroxyphenyl) alkanes.
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Knors Christopher J.
Miura Steve S.
Montgomery Melvin W.
Moreau Wayne M.
Smith Randolph J.
Bowers Jr. Charles L.
Chu John S.
International Business Machines Corporations
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