Fast atom beam source

Details Fast atom beam source Fast atom beam source

1994-08-12

1996-05-21

Anderson, Bruce C.

Liquid purification or separation

Combined

H01S 100, H01S 300, H05H 302

Patent

active

055192130

ABSTRACT:
A fast atom beam source is capable of efficiently emitting a fast atom beam with low energy and high particle flux. A plate-shaped electrode has a plurality of atom emitting holes. A pair of electrodes are disposed in series opposite the plate-shaped electrode so as to form an electric discharge part. An AC power supply impresses an AC voltage between the pair of electrodes. A DC power supply impresses a DC voltage between the plate-shaped electrode and one of the pair of electrodes that is closer to the plate-shaped electrode. A gas inlet introduces a gas to induce electric discharge in the space between the plate-shaped electrode and the pair of electrodes.

REFERENCES:
patent: 5055672 (1991-10-01), Nagai
patent: 5216241 (1993-06-01), Hatakeyama et al.
patent: 5221841 (1993-06-01), Nagai et al.
patent: 5243189 (1993-09-01), Nagai et al.
Shimokawa et al., "Reactive-fast-atom beam etching of GaAs using Cl.sub.2 gas", J. Appl. Phys. 66(6), Sep. 15, 1989, pp. 2613-2618.
Hatakeyama, "A FAB Source for SIMS", Hyomen-Kagaku (Surface Science), vol. 10, No. 1, 1989, pp. 29-33.
Patent Abstracts of Japan, vol. 9, No. 270 (E353) Oct. 26, 1985.
Shimokawa et al., "A Low-Energy Fast-Atom Source", Nuclear Instruments & Methods in Physics Research, vol. B33, No. 1-4, Jun. 1988, pp. 867-870.
Carruth, Jr. et al., "Method for determination of neutral atomic oxygen flux", Review of Scientific Instruments, vol. 61, No. 4, Apr. 1990, pp. 1211-1216.

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