Fast atom beam source

Details Fast atom beam source Fast atom beam source

1991-08-30

1993-06-22

Berman, Jack I.

Radiant energy

Electrically neutral molecular or atomic beam devices and...

250396R, H05H 302

Patent

active

052218414

ABSTRACT:
A fast atom beam source used e.g., for sputtering, includes an ion source that emits an ion beam and an electron gun that emits an electron beam at a speed substantially equal to the speed of the ions in the ion beam emitted from the ion source and in the same direction as that of the ion beam. The fast atom beam source may also include a speed control for regulating the speed of the electrons in the electron beam emitted from said electron gun to a level substantially equal to that of the speed of the ions in the ion beam, and a deflector which aligns the electron beam with the ion beam.

REFERENCES:
patent: 3846636 (1974-11-01), Zehr et al.
patent: 4818872 (1989-04-01), Parker et al.
patent: 4916311 (1990-04-01), Fuzishita et al.
Gohda, H. et al., "SIMS Analysis of Insulating Materials Using A New Type Electron Neutralizing Gun", Materials for the 54th Study Meeting of the Japan Society for the Promotion of Sciences, No. 604, pp. 46-51 (Dec. 1987).

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