Faraday system and ion implantation apparatus comprising the...

Details Faraday system and ion implantation apparatus comprising the... Faraday system and ion implantation apparatus comprising the...

2008-09-30

2008-09-30

Nguyen, Kiet T (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

With detector

C250S492210

Reexamination Certificate

active

11376292

ABSTRACT:
A Faraday system is disclosed wherein the Faraday system comprises a Faraday cup adapted to collect an ion beam to generate a current, a suppression electrode adapted to form an electric field adjacent to an inlet of the Faraday cup to prevent secondary electrons from discharging from the Faraday cup in response to the ion beam, and a housing surrounding the Faraday cup and the suppression electrode and comprising a plurality of apertures, wherein each aperture is adapted to selectively receive an ion beam comprising a corresponding type of conductive impurities.

REFERENCES:
patent: 4751393 (1988-06-01), Corey et al.
patent: 6723998 (2004-04-01), Bisson et al.
patent: 7109499 (2006-09-01), Angel et al.
patent: 2004/0058518 (2004-03-01), Fang et al.

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