Surgery – Respiratory method or device – Face mask covering a breathing passage
Reexamination Certificate
2006-08-15
2006-08-15
Mitchell, Teena (Department: 3743)
Surgery
Respiratory method or device
Face mask covering a breathing passage
C128S206210
Reexamination Certificate
active
07089941
ABSTRACT:
A face mask support for continuous positive airway pressure comprises a circumferential band with biasing means support at the crown of the head on the medial line of the head. The circumferential edge of the cap extends from just below the forehead of a patient to below the inion protrusion at the nape of the neck. A biasing means which is preferably of length of spring steel is formed so as to extend from the biasing means support hold a nasal or face mask apposed to the face of a patient. The circumferential band is stabilized by a band extending from the circumferential band at the region of the ear to the biasing means support.
REFERENCES:
patent: 1081745 (1913-12-01), Johnston et al.
patent: 4151843 (1979-05-01), Brekke et al.
patent: 4593688 (1986-06-01), Payton
patent: 4944310 (1990-07-01), Sullivan
patent: 5421799 (1995-06-01), Rabin et al.
patent: 5538000 (1996-07-01), Rudolph
patent: 5623923 (1997-04-01), Bertheau et al.
patent: 5687715 (1997-11-01), Landis et al.
patent: 5724965 (1998-03-01), Handke et al.
patent: 6119693 (2000-09-01), Kwok et al.
patent: 6347631 (2002-02-01), Hansen et al.
patent: 6494207 (2002-12-01), Kwok
patent: 6505623 (2003-01-01), Hansen
patent: 6516802 (2003-02-01), Hansen et al.
patent: 6530373 (2003-03-01), Patron et al.
patent: 6536435 (2003-03-01), Fecteau et al.
patent: 6789543 (2004-09-01), Cannon
patent: 6854465 (2005-02-01), Bordewick et al.
patent: 6886564 (2005-05-01), Sullivan et al.
patent: 2002/0011248 (2002-01-01), Hansen et al.
patent: 2003/0051732 (2003-03-01), Smith et al.
patent: 2003/0172936 (2003-09-01), Wilkie et al.
patent: 2004/0025882 (2004-02-01), Madaus et al.
patent: 2004/0226566 (2004-11-01), Gunaratnam et al.
patent: 2005/0076913 (2005-04-01), Ho et al.
Bordewick Steven S.
Brandt Laurel D.
Markovich David
Raatikka Amy
Weimholt Mark J.
Cyr Kevin W.
Kondzella & Cyr, P.A.
Mitchell Teena
LandOfFree
Face mask support does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Face mask support, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Face mask support will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3626290