Surgery – Respiratory method or device – Means for removing substance from respiratory gas
Reexamination Certificate
2007-02-06
2007-02-06
Mitchell, Teena (Department: 3771)
Surgery
Respiratory method or device
Means for removing substance from respiratory gas
C128S205250
Reexamination Certificate
active
10423382
ABSTRACT:
A mask includes a filter layer and a support base supporting the filter layer. The filter layer has first and second complimentary portions that together form a rim, where the first portion is connected to the second portion at first and second seams. The first seam extends from the rim to a first pleat, while the second seam extends from the rim to a second pleat. The first pleat is connected to the second pleat by an unpleated central portion. The first pleat, second pleat and unpleated central portion are formed by the first and second portions of the filter layer.
REFERENCES:
patent: 1523884 (1925-01-01), LeDuc
patent: 3500825 (1970-03-01), Andersson et al.
patent: 3664335 (1972-05-01), Boucher et al.
patent: 3971369 (1976-07-01), Aspelin et al.
patent: D249072 (1978-08-01), Revoir
patent: 4133309 (1979-01-01), Kohler et al.
patent: 4215682 (1980-08-01), Kubik et al.
patent: 4245220 (1981-01-01), Johnson
patent: 4417575 (1983-11-01), Hilton et al.
patent: 4419994 (1983-12-01), Hilton
patent: 4536440 (1985-08-01), Berg
patent: 4547420 (1985-10-01), Krueger et al.
patent: 4628927 (1986-12-01), Ward
patent: 4827924 (1989-05-01), Japuntich
patent: 4874339 (1989-10-01), Bratz
patent: 5025506 (1991-06-01), Huang
patent: 5232529 (1993-08-01), Miyake
patent: 5325892 (1994-07-01), Japuntich et al.
patent: 5357947 (1994-10-01), Adler
patent: 5927280 (1999-07-01), Miyake
patent: 5954055 (1999-09-01), Miyake
patent: 6123077 (2000-09-01), Bostock et al.
patent: 6145504 (2000-11-01), Miyake
patent: 6336459 (2002-01-01), Miyake et al.
patent: RE37974 (2003-02-01), Bowers
patent: 32 04322 (1983-08-01), None
patent: 1 118 278 (2001-07-01), None
patent: 2 045 093 (1980-10-01), None
Brunell Robert A.
Snow George A.
Bromberg & Sunstein LLP
Louis M. Gerson Co., Inc.
Mitchell Teena
LandOfFree
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