Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of coating supply or source outside of primary...
Reexamination Certificate
2008-05-27
2008-05-27
Moore, Karla (Department: 1792)
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of coating supply or source outside of primary...
C427S248100, C427S249100, C118S719000, C118S726000
Reexamination Certificate
active
10651286
ABSTRACT:
The present invention provides a vapor deposition system for a film forming systems that promote an efficiency of utilizing an EL material and is excellent in uniformity or throughput of forming an EL layer and a vapor deposition method. According to the present invention, vapor deposition is carried out in a deposition chamber by moving an evaporation source holder903on which six containers911filled with an evaporation material are set at a certain pitch with respect to the substrate. The evaporation holder903is transported from an installation chamber905by a transport mechanism902b. A heater is provided in a turntable907. Throughput can be improved by heating the evaporation holder903in advance of transporting containers into the evaporation holder903.
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International Search Report Application No. PCT/JP03/11099 Dated Feb. 3, 2004.
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Kuwabara Hideaki
Murakami Masakazu
Yamazaki Shunpei
Costellia Jeffrey L.
Moore Karla
Nixon & Peabody LLP
Semiconductor Energy Laboratory Co,. Ltd.
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