Fabrication procedure using arsenate glasses

Details Fabrication procedure using arsenate glasses Fabrication procedure using arsenate glasses

1981-06-04

1983-10-04

Roy, Upendra

Metal working

Method of mechanical manufacture

Assembling or joining

501 84, 501 86, 501 22, 501141, 148 15, 204192S, 204192SP, 204192D, 427 82, 4271263, 4272481, C03C 312, C03C 326, B05D 134

Patent

active

044070616

ABSTRACT:
A fabrication technique is described for making various devices in which a certain type of glass is used as a surface protection layer. The glass layers are formed by particle bombardment (generally sputtering or E-beam) of a glass target. Devices with such surface layers are also described. Such glass layers are highly advantageous as encapsulating layers, diffusion barrier layers, etc., particularly for optical type devices and certain semiconductor devices. Particularly important is the preparation procedure for the glass target used in the bombardment process. The glass layers are moisture stable, act as excellent barriers against diffusion, and are usable up to quite high temperatures (i.e., in diffusion doping procedures) without cracking or peeling. The glass layers also provide long-term protection against atmosphere components including water vapor, oxygen, atmosphere pollution contaminants, etc., and can be removed by standard etching techniques.

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Park et al., IBM-J. Research & Development, 22, (1978), 607-612.
Campbell, Vacuum, 27, (1977), 213-224.
Wikorczyk et al., Thin Solid Films, 58, (1979), 313.

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