Fabrication of rail of magnetic head slider

Details Fabrication of rail of magnetic head slider Fabrication of rail of magnetic head slider

1998-06-15

2000-05-16

Bryant, David P.

Metal working

Method of mechanical manufacture

Electrical device making

2960316, 2960318, 216 47, 216 66, G11B 5127, C23F 100

Patent

active

060618973

ABSTRACT:
A first resist mask is formed on a rail, covering an area where none of a shallow surface and a deep surface are formed. A first etching process is performed to etch the rail not covered with the first resist mask to a depth corresponding to the shallow surface. Next, without removing the first resist mask, a second resist mask is formed covering an area where the shallow surface is formed. A second etching process is performed to etch the rail not covered with the first and second resist masks, to a depth corresponding to the deep surface. After the first and second etching processes, the first and second resist masks are removed from the rail.

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