Fabrication of phase-shifting lithographic masks

Details Fabrication of phase-shifting lithographic masks Fabrication of phase-shifting lithographic masks

1992-11-25

1994-08-16

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430312, 2504923, G03F 900

Patent

active

053386264

ABSTRACT:
A phase-shifting lithographic mask is fabricated, in one embodiment, by using a resist layer that is negative tone with respect to a (patterned) electron beam and is positive tone with respect to a (flood) mid-ultraviolet beam, with the tone of the electron beam predominating over that of the mid-ultraviolet beam. The resist layer is spun on a body comprising a patterned metallic layer located on a (transparent) quartz slab. The body is subjected from below to a flood mid-ultraviolet beam and from above to a patterned electron beam whose edges are located somewhere in the midst of the patterned opaque layer but are not coincident with any edges of the patterned opaque layer. Thus, a subsequent development of the resist layer removes those regions and only those regions of the resist layer upon which the ultraviolet beam was incident--i.e., not in the shadows cast by the patterned opaque layer--in the absence of incidence of the patterned electron beam. Then, an anisotropic etching removes to a prescribed depth the portions of the (transparent) substrate not covered by the remaining (patterned) resist layer. In other embodiments, the (patterned) electron beam is replaced by a (patterned) deep ultraviolet beam. In still other embodiments the same radiation (wavelength) can be used for the patterned beam as for the flood radiation in conjunction with a resist layer whose tone can be reversed by an intermediate processing step between irradiations with the patterned and flood beams, respectively.

REFERENCES:
patent: 4948706 (1990-08-01), Sugihara et al.
patent: 5126220 (1992-06-01), Tokitomo et al.
W. D. Hinsberg, et al., "A Lithographic Analog of Color Photography: Self-Aligning Photolithography Using a Resist with Wavelength-Dependent Tone", J. of Imaging Science, vol. 33, No. 4 (1989).
Pfau, A. K. et al., Proc. SPIE, Optical/Laser Microlithography II (1991), pp. 124-134.

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