Fabrication of particle beam masks

Details Fabrication of particle beam masks Fabrication of particle beam masks

1990-12-11

1992-11-24

Trans, Vincent N.

Boots, shoes, and leggings

364490, 364489, 364488, 2504923, G06F 1520, H01J 2700

Patent

active

051668882

ABSTRACT:
A method for automatically splitting a layout of a hole pattern into two complementary arrangements for x-ray, electron beam, ion beams, i.e., particle beam masks. The method determines all inside and outside corners of said pattern and determining a stability value for the pattern so the pattern can be divided into stable sections and alternately distributed over two complementary masks.

REFERENCES:
patent: 4109029 (1978-08-01), Ozdemir et al.
patent: 4132898 (1979-01-01), Buelow et al.
patent: 4520269 (1985-05-01), Jones et al.
patent: 4717644 (1988-01-01), Jones et al.
"Electron-Beam Proximity Printing-A New High-Speed Lithography Method for Submicron Structures" by H. Bohlen, IBM J. Res. Develop., vol. 26, No. 5, Sep. 1982, pp. 568-579.

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