Fabrication of optical waveguides for reduction of minimum...

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Other Related Categories

C438S022000, C438S584000

Type

Reexamination Certificate

Status

active

Patent number

06864114

Description

ABSTRACT:
A fabrication method reduces minimum waveguide spacing in an integrated optical device. Core regions of the waveguides are etched into cladding material and then filled with core material, instead of etching the spacing between the core material first and then filling the spacing. This allows the spacing between the core regions to be made arbitrarily small, without being constrained by an aspect ratio associated with a conventional etch and deposition/re-flow process used to form waveguide spacings.

REFERENCES:
patent: 5193137 (1993-03-01), Hoshino et al.
patent: 5281305 (1994-01-01), Lee et al.
patent: 02251912 (1990-10-01), None
patent: 09080246 (1997-03-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Fabrication of optical waveguides for reduction of minimum... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fabrication of optical waveguides for reduction of minimum..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fabrication of optical waveguides for reduction of minimum... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3377438

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.