Fabrication of optical waveguides for reduction of minimum...

Details Fabrication of optical waveguides for reduction of minimum... Fabrication of optical waveguides for reduction of minimum...

2005-03-08

2005-03-08

Pham, Long (Department: 2814)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S022000, C438S584000

Reexamination Certificate

active

06864114

ABSTRACT:
A fabrication method reduces minimum waveguide spacing in an integrated optical device. Core regions of the waveguides are etched into cladding material and then filled with core material, instead of etching the spacing between the core material first and then filling the spacing. This allows the spacing between the core regions to be made arbitrarily small, without being constrained by an aspect ratio associated with a conventional etch and deposition/re-flow process used to form waveguide spacings.

REFERENCES:
patent: 5193137 (1993-03-01), Hoshino et al.
patent: 5281305 (1994-01-01), Lee et al.
patent: 02251912 (1990-10-01), None
patent: 09080246 (1997-03-01), None

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